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Atomic Structural Analysis of a Monolayer Epitaxial Film of Hexagonal Boron Nitride/Ni(111) studied by LEED Intensity Analysis(Interfaces by various techniques)
https://doi.org/10.50974/00043821
https://doi.org/10.50974/000438215d617604-9dcb-4a65-a433-4de3eda91eb8
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
KJ00004200858.pdf (394.6 kB)
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| Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2008-05-02 | |||||
| タイトル | ||||||
| タイトル | Atomic Structural Analysis of a Monolayer Epitaxial Film of Hexagonal Boron Nitride/Ni(111) studied by LEED Intensity Analysis(Interfaces by various techniques) | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | h-BN | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | LEED analysis | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | epitaxial film | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | rumpling structure | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | monolayer | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | departmental bulletin paper | |||||
| ID登録 | ||||||
| ID登録 | 10.50974/00043821 | |||||
| ID登録タイプ | JaLC | |||||
| 著者 |
Gamou, Yasuo
× Gamou, Yasuo× Terai, Masayuki× Nagashima, Ayato× Oshima, Chuhei |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | The atomic structure of a monolayer epitaxial film of hexagonal boron nitride (h-BN) formed on a Ni(111) surface was investigated by means of LEED intensity analysis. We measured the I-V curves of the (1, 0), (0, 1) and (1, 1) diffraction spots from a 1×1 atomic structure, and analyzed them by using Van Hove's analytical program based on dynamical theory. Six different atomic structural models meeting the experimental requirement of the 3-m symmetry were evaluated with Pendry's reliability factor. The final best-fit structure characterized by the minimum Pendry's reliability factor of 0.27 is as follows; the nitrogen atom in a unit cell of the h-BN overlayer is located at the on-top site of the topmost Ni atoms, while the boron atom exists at the fcc-hollow site. The spacings between the nitrogen (boron) atom and the topmost Ni layer is 2.04Å(2.2Å), which is much narrower than the interlayer spacing in bulk h-BN (3.33Å). | |||||
| 書誌情報 |
Science reports of the Research Institutes, Tohoku University. Ser. A, Physics, chemistry and metallurgy 巻 44, 号 2, p. 211-214, 発行日 1997-03-31 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 00408808 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00836167 | |||||
| フォーマット | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | application/pdf | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
| 出版者 | ||||||
| 出版者 | Tohoku University | |||||
| 資源タイプ | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | 紀要類(bulletin) | |||||
| 登録日 | ||||||
| 日付 | 2008-05-02 | |||||
| 日付タイプ | Created | |||||
| 公開日（投稿完了日） | ||||||
| 日付 | 2008-05-02 | |||||
| 日付タイプ | Created | |||||
| 発行日 | ||||||
| 日付 | 1997-03-31 | |||||
| 日付タイプ | Created | |||||
| フォーマット | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | 394586 bytes | |||||
| 更新日 | ||||||
| 日付 | 2010-01-27 | |||||
| 日付タイプ | Created | |||||
