{"created":"2023-07-27T04:46:22.972184+00:00","id":46851,"links":{},"metadata":{"_buckets":{"deposit":"0559c606-99a5-4d1c-962a-3190dcdf8b90"},"_deposit":{"created_by":3,"id":"46851","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"46851"},"status":"published"},"_oai":{"id":"oai:tohoku.repo.nii.ac.jp:00046851","sets":["76:267"]},"author_link":["110011","110010","110009","110012","110013"],"item_4_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1990-03-23","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"83","bibliographicPageStart":"74","bibliographicVolumeNumber":"35","bibliographic_titles":[{"bibliographic_title":"Science reports of the Research Institutes, Tohoku University. Ser. A, Physics, chemistry and metallurgy"}]}]},"item_4_date_62":{"attribute_name":"登録日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2008-05-02","subitem_date_issued_type":"Created"}]},"item_4_date_63":{"attribute_name":"公開日（投稿完了日）","attribute_value_mlt":[{"subitem_date_issued_datetime":"2008-05-02","subitem_date_issued_type":"Created"}]},"item_4_date_65":{"attribute_name":"発行日","attribute_value_mlt":[{"subitem_date_issued_datetime":"1990-03-23","subitem_date_issued_type":"Created"}]},"item_4_date_80":{"attribute_name":"更新日","attribute_value_mlt":[{"subitem_date_issued_datetime":"2010-01-27","subitem_date_issued_type":"Created"}]},"item_4_description_15":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_4_description_4":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In an effort to improve soft magnetic properties of amorphous CoNbZr films at high frequency, we have investigated the effect of both magnetic field and sputtering deposition conditions on magnetic properties of the films. A uniform magnetic field from a pair of permanent magnets was applied during film deposition. The magnetic field results in the in-plane uniaxial magnetic anisotropy in the films. Permeability(μ) of the films is dependent on the intensity of an applied field, and is independent of frequency more than 10 MHz. Argon(Ar) gas pressure and RF input power during film preparation can controll the magnitude of anisotropy and permeability. These films are consistent with the equation of μ=Bs/Hk : Bs : Saturation induction, Hk : anisotropy field.","subitem_description_type":"Abstract"}]},"item_4_description_41":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"紀要類(bulletin)","subitem_description_type":"Other"}]},"item_4_description_66":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"443690 bytes","subitem_description_type":"Other"}]},"item_4_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.50974/00043414","subitem_identifier_reg_type":"JaLC"}]},"item_4_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Tohoku University"}]},"item_4_radio_69":{"attribute_name":"公開範囲","attribute_value_mlt":[{"subitem_radio_item":"学外"}]},"item_4_source_id_7":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"00408808","subitem_source_identifier_type":"ISSN"}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA00836167","subitem_source_identifier_type":"NCID"}]},"item_4_version_type_16":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Ohnuma, S."}],"nameIdentifiers":[{"nameIdentifier":"110009","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Hayashide, M."}],"nameIdentifiers":[{"nameIdentifier":"110010","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Matsumoto, F."}],"nameIdentifiers":[{"nameIdentifier":"110011","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Fujimori, H."}],"nameIdentifiers":[{"nameIdentifier":"110012","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Masumoto, T."}],"nameIdentifiers":[{"nameIdentifier":"110013","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-02-16"}],"displaytype":"detail","filename":"KJ00004200320.pdf","filesize":[{"value":"443.7 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00004200320.pdf","url":"https://tohoku.repo.nii.ac.jp/record/46851/files/KJ00004200320.pdf"},"version_id":"9073873f-f930-46d3-a320-019578c1209d"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Magnetic Properties of Amorphous CoNbZr Films Sputter-deposited in Magnetic Field","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Magnetic Properties of Amorphous CoNbZr Films Sputter-deposited in Magnetic Field"}]},"item_type_id":"4","owner":"3","path":["267"],"pubdate":{"attribute_name":"公開日","attribute_value":"2008-05-02"},"publish_date":"2008-05-02","publish_status":"0","recid":"46851","relation_version_is_last":true,"title":["Magnetic Properties of Amorphous CoNbZr Films Sputter-deposited in Magnetic Field"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-07-27T11:44:11.094391+00:00"}