@article{oai:tohoku.repo.nii.ac.jp:00053572,
 author = {Shioji, M. and Shiraishi, T. and Takahashi, K. and Nohira, H. and Azuma, K. and Nakata, Y. and Takata, Y. and Shin, S. and Kobayashi, K. and Hattori, T.},
 issue = {19},
 journal = {Applied Physics Letters},
 month = {May},
 note = {application/pdf, 学術論文 (Article), 60735 bytes},
 pages = {3756--3758},
 title = {X-ray photoelectron spectroscopy study on SiO2/Si interface structures formed by three kinds of atomic oxygen at 300 °C},
 volume = {84},
 year = {2004}
}