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Theoretical analysis of the diffusive ion in biased plasma enhanced diamond chemical vapor deposition
http://hdl.handle.net/10097/35306
http://hdl.handle.net/10097/35306296b7ace-009a-456e-8473-9d2d8621775e
名前 / ファイル | ライセンス | アクション |
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JApplPhys_90_2559.pdf (158.3 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2008-10-17 | |||||
タイトル | ||||||
タイトル | Theoretical analysis of the diffusive ion in biased plasma enhanced diamond chemical vapor deposition | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Saito, R.
× Saito, R.× Sano, J.× Ishigaki, N.× Kimura, T.× Yugo, S. |
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著者別名 | ||||||
姓名 | 齋藤, 理一郎 | |||||
書誌情報 |
Journal of Applied Physics 巻 90, 号 5, p. 2559-2564, 発行日 2001-09 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 0021-8979 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1063/1.1389524 | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | application/pdf | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
出版者 | ||||||
出版者 | American Institute of Physics | |||||
資源タイプ | ||||||
内容記述タイプ | Other | |||||
内容記述 | 学術論文 (Article) | |||||
登録日 | ||||||
日付 | 2008-10-17 | |||||
日付タイプ | Created | |||||
公開日(投稿完了日) | ||||||
日付 | 2008-10-17 | |||||
日付タイプ | Created | |||||
発行日 | ||||||
日付 | 2001 | |||||
日付タイプ | Created | |||||
フォーマット | ||||||
内容記述タイプ | Other | |||||
内容記述 | 158304 bytes | |||||
公開範囲 | ||||||
値 | 学外 | |||||
大学情報DB画面区分 | ||||||
値 | K020 | |||||
大学情報DBリンク番号 | ||||||
121095 | ||||||
大学情報DBリポジトリ区分 | ||||||
値 | 許諾 | |||||
更新日 | ||||||
日付 | 2009-06-22 | |||||
日付タイプ | Created |