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Surface Structure and Chemical Reactivity of Electrodeposited Nickel
http://hdl.handle.net/10097/27363
http://hdl.handle.net/10097/273637a9e1a80-dcec-41aa-b66c-806174a145e4
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||||
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公開日 | 2008-05-02 | |||||||
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タイトル | Surface Structure and Chemical Reactivity of Electrodeposited Nickel | |||||||
言語 | ||||||||
言語 | eng | |||||||
資源タイプ | ||||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||||
資源タイプ | departmental bulletin paper | |||||||
著者 |
HASHIMOTO, Koji
× HASHIMOTO, Koji
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抄録 | ||||||||
内容記述タイプ | Abstract | |||||||
内容記述 | Structure and distribution of chemically reactive areas have been studied on electrodeposited polycrystalline nickel having (211), (210) and (110) preferred orientations by means of electron microscopy. These characteristic preferred orientations occur in nickel specimens more than a few μ in thickness electro-deposited on mechanically polished copper substrates. Special procedures have been devised in order to directly observe the structures of thin top layers of the thick deposits having the preferred orientations by means of transmission electron microscopy. A large number of hillocks with the (111) twins are formed in an electrodeposited nickel with the (211) orientation. This result was previously obtained by the author by means of reflection electron diffraction and electron microscopy using replicas, and has been confirmed in the present study. It has also been found that twin and grain boundaries in these deposits are chemically reactive and dissolved initially in a corrosive solution. In an electrodeposited nickel with the (210) orientation, twin boundaries and stacking faults are dissolved during immersion in the corrosive solution. In an electrodeposited nickel with the (110) orientation, the twinning is seldom formed, and the deposit shows no areas remarkable in chemical reactivity except grain boundaries. The electrodeposited nickel with the (211) orientation prepared by the present electrodepositing conditions appears to be more chemically reactive than the deposits having other orientations, because a high density of chemically reactive crystal defects is found in the former. | |||||||
書誌情報 |
Science reports of the Research Institutes, Tohoku University. Ser. A, Physics, chemistry and metallurgy 巻 19, p. 157-157, 発行日 1967 |
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収録物識別子タイプ | ISSN | |||||||
収録物識別子 | 00408808 | |||||||
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収録物識別子タイプ | NCID | |||||||
収録物識別子 | AA00836167 | |||||||
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内容記述タイプ | Other | |||||||
内容記述 | application/pdf | |||||||
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出版タイプ | VoR | |||||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||||
出版者 | ||||||||
出版者 | Tohoku University | |||||||
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内容記述タイプ | Other | |||||||
内容記述 | 紀要類(bulletin) | |||||||
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日付 | 2008-05-02 | |||||||
日付タイプ | Created | |||||||
公開日(投稿完了日) | ||||||||
日付 | 2008-05-02 | |||||||
日付タイプ | Created | |||||||
発行日 | ||||||||
日付 | 1967 | |||||||
日付タイプ | Created | |||||||
フォーマット | ||||||||
内容記述タイプ | Other | |||||||
内容記述 | 53808 bytes | |||||||
更新日 | ||||||||
日付 | 2010-01-27 | |||||||
日付タイプ | Created |
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Cite as
HASHIMOTO, Koji, 1967, Surface Structure and Chemical Reactivity of Electrodeposited Nickel: Tohoku University, 157–157 p.
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